Harmonic filter for 400 and 800 nm
Designed for ultrafast Ti:Sapphire fundamental and first harmonic
Minimum pulse dispersion
The harmonic beamsplitter offers high reflectance for 400 nm and high transmission at 800 nm, separating the fundamental Ti:Sapphire wavelength from the first harmonic. Constructed of durable fused silica, the front surface of the thin 3 mm thickness substrate is coated with an ultrafast optimized beamsplitter coating and the back side coated with an AR coating. This dichroic filter will easily satisfy the need for ultrafast beam harmonics separation.
| Material | Fused Silica |
| Wavefront Distortion | ≤λ/4 at 632.8 nm over the clear aperture |
| Surface Flatness S1& S2 | ≤λ/10 at 632.8 nm over the clear aperture |
| Clear Aperture | > central 85% of diameter |
| Surface Quality | 10-5 scratch-dig |
| Diameter (mm) | 25.4 +0/-0.25 |
| Thickness (mm) | 3.0 ±0.5 |
| Wedge (arc min) | ≤3 |
| Chamfers | 0.25-0.76 mm face width x 45° ±15° |
| Angle of Incidence | 45 ° |
| Nominal Reflectivity | Back surface R≤0.3% |
| Durability | MIL-C-675C, moderate abrasion million cycles |
| Cleaning | Non-abrasive method, acetone or isopropyl alcohol on lens tissue recommended see Care and Cleaning of Optics (see How to Clean Optics) |
| Damage Threshold | 5.0 J/cm2 with 10 nsec pulses @ 1064 nm, typical |
Note: Reflection and transmission at wavelengths other than the specified harmonic wavelengths are uncontrolled and can vary significantly. Use of harmonic beamsplitters outside the design wavelengths is not recommended.